专利名称:OPTICAL ELEMENT POSITIONING
APPARATUS, PROJECTION OPTICAL SYSTEMAND EXPOSURE APPARATUS
发明人:Ryo Nawata,Makoto Mizuno,Shigeyuki
Uzawa
申请号:US12171644申请日:20080711
公开号:US20090021847A1公开日:20090122
专利附图:
摘要:The apparatus includes a holder holding an optical element, a back plate
supporting the optical element via the holder, a mechanism moving the optical elementin a six-degree-of-freedom, a base plate supporting the back plate via the mechanism,and six displacement sensors disposed on the base plate and measuring displacementamounts of different points on the optical element. The displacement sensors includesthree ones measuring them in a first direction, one measuring it in a second direction, andtwo ones measuring them in a third direction. The apparatus further includes atransformation processor transforming the six measured displacement amounts intodisplacement amounts of the optical element in the six-degree-of-freedom, a calibrationprocessor calibrating the transformed displacement amounts, and a controller
outputting command values to the displacing mechanism based on differences betweenthe calibrated displacement amounts and target displacement amounts of the opticalelement.
申请人:Ryo Nawata,Makoto Mizuno,Shigeyuki Uzawa
地址:Utsunomiya-shi JP,Utsunomiya-shi JP,Utsunomiya-shi JP
国籍:JP,JP,JP
更多信息请下载全文后查看
因篇幅问题不能全部显示,请点此查看更多更全内容