专利名称：MICROORGANISM CULTURE METHOD AND
CULTURE APPARATUS
发明人：Tetsuya ISHII,Kanetomo SATOU,Yoji
FUJIMORI,Kokoro HAMACHI,NorihideNISHIYAMA
申请号：US15511800申请日：20150914
公开号：US20170306286A1公开日：20171026
专利附图：
摘要：Gas-utilizing microorganisms are stably cultured regardless of variations in a
supply flow rate of a substrate gas. Gas-utilizing microorganisms are cultured in a culturesolution in a culture tank . A substrate gas containing CO and Hor the like is supplied tothe culture tank and is dissolved in the culture solution . When a supply flow rate of thesubstrate gas or predetermined constituents of the substrate gas to the culture tankbecomes a predetermined value or lower, a culture solution is rapidly discharged fromthe culture tank
申请人：SEKISUI CHEMICAL CO., LTD.
地址：Osaka JP
国籍：JP
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容